Explore how correlative light and electron microscopy (CLEM) enables high-resolution insights into endocytic sorting.

Abstract: The continuous miniaturization of semiconductor patterns improves performance but also leads to frequent pattern disruptions that significantly reduce manufacturing yields. In the field, ...

A new technical paper, “3D atomic-scale metrology of strain relaxation and roughness in Gate-All-Around transistors via electron ptychography,” was published by researchers at Cornell University, ASM ...

Scientists have developed a new imaging technique that uses a novel contrast mechanism in bioimaging to merge the strengths ...